Dr. Joost Bekaert
at IMEC
SPIE Involvement:
Author
Publications (58)

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Cadmium, Etching, Manufacturing, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Data centers, Failure analysis

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Metrology, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

SPIE Journal Paper | 17 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

Proceedings Article | 23 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

Proceedings Article | 21 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Showing 5 of 58 publications
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