Dr. Joost Bekaert
at imec
SPIE Involvement:
Author
Publications (62)

Proceedings Article | 24 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Cadmium, Calibration, Etching, Silicon, 3D modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 November 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Metrology, Cadmium, Defect detection, Etching, Inspection, Finite element methods, Critical dimension metrology, Optical correlators, Failure analysis, Stochastic processes

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Phase modulation, Metals, Phase shift keying, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

Showing 5 of 62 publications
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