CONFERENCE PROCEEDINGS
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Joost Smits
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 19 March 2018 Presentation + Paper
EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update
Roderik van Es, Mark van de Kerkhof, Arthur Minnaert, Geert Fisser, Jos de Klerk, Joost Smits, Roel Moors, Eric Verhoeven, Leon Levasier, Rudy Peeters, Marco Pieters, Hans Meiling
Proceedings Volume 10583, 105830H (2018) https://doi.org/10.1117/12.2299503
KEYWORDS: Scanners, Semiconducting wafers, Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Projection systems, Fiber optic illuminators, Reticles, Manufacturing
Proceedings Article | 12 April 2013 Paper
Extending immersion lithography down to 1x nm production nodes
Wim de Boeij, Remi Pieternella, Igor Bouchoms, Martijn Leenders, Marjan Hoofman, Roelof de Graaf, Haico Kok, Par Broman, Joost Smits, Jan-Jaap Kuit, Matthew McLaren
Proceedings Volume 8683, 86831L (2013) https://doi.org/10.1117/12.2021397
KEYWORDS: Reticles, Scanners, Semiconducting wafers, HVAC controls, Overlay metrology, Calibration, Sensors, Metrology, Distortion, Optical lithography
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