Dr. Joren Severi
at imec 4 Warehouse
SPIE Involvement:
Publications (21)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124951D (2023) https://doi.org/10.1117/12.2661138
KEYWORDS: Extreme ultraviolet lithography, Photoresist technology, Line edge roughness, Critical dimension metrology, Critical dimension scanning electron microscopy, Image processing, Signal to noise ratio, Denoising, Scanning electron microscopy, Metrology, Line width roughness, Artificial intelligence, Machine learning

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12494, 1249410 (2023) https://doi.org/10.1117/12.2657287
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Light sources and illumination, Extreme ultraviolet, Scanners, 3D mask effects, Metal oxides, Optical simulations, Simulations

SPIE Journal Paper | 14 December 2022
JM3, Vol. 22, Issue 02, 021006, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.021006
KEYWORDS: Signal to noise ratio, Scanning electron microscopy, Line scan image sensors, Edge detection, Line width roughness, Line edge roughness, Simulations, Edge roughness, Metrology, Electron microscopes

SPIE Journal Paper | 10 December 2022
JM3, Vol. 22, Issue 02, 021002, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.021002
KEYWORDS: Signal to noise ratio, Metrology, Scanning electron microscopy, Shrinkage, Line scan image sensors, Semiconducting wafers, Photoresist materials, Critical dimension metrology, Extreme ultraviolet lithography, Line width roughness

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 122920I (2022) https://doi.org/10.1117/12.2643315
KEYWORDS: Signal to noise ratio, Denoising, Line width roughness, Scanning electron microscopy, Metrology

Showing 5 of 21 publications
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