Dr. Joerg Bischoff
CEO at OSIRES
SPIE Involvement:
Conference Program Committee | Author
Publications (25)

PROCEEDINGS ARTICLE | July 6, 2018
Proc. SPIE. 10698, Space Telescopes and Instrumentation 2018: Optical, Infrared, and Millimeter Wave
KEYWORDS: Telescopes, Optical filters, Mirrors, Fabry–Perot interferometers, Imaging systems, Polarimetry, Space telescopes, Optical alignment

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Scattering, Light scattering, 3D modeling, Scatterometry, Optical metrology, Near field, Line width roughness, Line edge roughness, Diffraction gratings

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Ellipsometry, Statistical analysis, Error analysis, Scanning electron microscopy, Spectroscopic ellipsometry, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Chemical elements

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Ellipsometry, Metrology, Modulation, Polarization, Computer simulations, Scanning electron microscopy, Spectroscopic ellipsometry, Photomasks, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Diffraction, Multilayers, Data modeling, Silica, Polarization, Glasses, Spectroscopic ellipsometry, Photomasks, Extreme ultraviolet, Critical dimension metrology

PROCEEDINGS ARTICLE | May 23, 2011
Proc. SPIE. 8083, Modeling Aspects in Optical Metrology III
KEYWORDS: Diffraction, Metrology, Polarization, Sensors, Matrices, 3D modeling, Atomic force microscopy, Optical simulations, Convolution, Diffraction gratings

Showing 5 of 25 publications
Conference Committee Involvement (7)
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
Modeling Aspects in Optical Metrology IV
13 May 2013 | Munich, Germany
Modeling Aspects in Optical Metrology
23 May 2011 | Munich, Germany
Showing 5 of 7 published special sections
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