Dr. Jörg Butschke
at IMS CHIPS
SPIE Involvement:
Author
Publications (53)

PROCEEDINGS ARTICLE | May 13, 2016
Proc. SPIE. 9891, Silicon Photonics and Photonic Integrated Circuits V
KEYWORDS: Optical design, Waveguides, Modulators, Multiplexers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Holograms, Diffractive optical elements, Etching, Quartz, Silicon, Photomasks, Nanoimprint lithography, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Etching, Silicon, Resistance, Photomasks, Line width roughness, Cadmium sulfide, Semiconducting wafers, Resolution enhancement technologies, Chemically amplified resists

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Gold, Electron beam lithography, Etching, Metals, Silicon, Scanning electron microscopy, Photomasks, Aluminum, Transistors, Semiconducting wafers

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beam lithography, Magnesium, Visualization, Data processing, Photomasks, Beam shaping, Data conversion, Computer architecture, Standards development

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Nanostructures, Electron beams, Electronics, Particles, Ions, Silicon, Photomasks, Semiconducting wafers, Nanofabrication

Showing 5 of 53 publications
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