Prof. Jorge J. Rocca
Univ Distinguished Professor at Colorado State Univ
SPIE Involvement:
Conference Program Committee | Conference Chair | Author | Editor
Publications (101)

PROCEEDINGS ARTICLE | July 5, 2017
Proc. SPIE. 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications
KEYWORDS: Optical amplifiers, Laser applications, Laser development, Semiconductor lasers, Extreme ultraviolet, Picosecond phenomena, X-ray lasers, Disk lasers, Pulsed laser operation, Cryogenics

PROCEEDINGS ARTICLE | June 16, 2017
Proc. SPIE. 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications
KEYWORDS: Oxides, Argon, Glasses, Nickel, Ions, Mass spectrometry, Laser ablation, X-ray lasers, Zone plates, Scandium

PROCEEDINGS ARTICLE | May 15, 2017
Proc. SPIE. 10236, Damage to VUV, EUV, and X-ray Optics VI
KEYWORDS: Capillaries

PROCEEDINGS ARTICLE | February 17, 2017
Proc. SPIE. 10082, Solid State Lasers XXVI: Technology and Devices
KEYWORDS: Ultrafast phenomena, Optical amplifiers, Laser applications, Amplifiers, Extreme ultraviolet, Picosecond phenomena, X-ray lasers, Disk lasers, Pulsed laser operation, Plasma, Laser systems engineering

PROCEEDINGS ARTICLE | December 6, 2016
Proc. SPIE. 10014, Laser-Induced Damage in Optical Materials 2016
KEYWORDS: Thin films, Silica, Etching, Argon, Laser induced damage, Ions, Dielectrophoresis, Molybdenum, Hybrid fiber optics, Absorption

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Ions, Plasmas, Solids, Extreme ultraviolet, Terbium, Extreme ultraviolet lithography, Picosecond phenomena, Gadolinium, Pulsed laser operation

Showing 5 of 101 publications
Conference Committee Involvement (27)
Ultrafast Optics 2017
8 October 2017 | Jackoson Hole, Wyoming, United States
Damage to VUV, EUV, and X-ray Optics (XDam6)
24 April 2017 | Prague, Czech Republic
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications
24 April 2017 | Prague, Czech Republic
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Showing 5 of 27 published special sections
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