Dr. Jörn N. Greif Profile

Dr. Jörn N. Greif

at Carl Zeiss Jena GmbH

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 15 October 2005 Paper

Design of a microscopy illumination using a partial coherent light source

Matthias Wald, Matthias Burkhardt, Alexander Pesch, Herbert Gross, Jörn Greif

Proceedings Volume 5962, 59621G (2005) https://doi.org/10.1117/12.625353

KEYWORDS: Diffractive optical elements, Light sources, Fourier transforms, Optical components, Microscopy, Speckle, Diffusers, Diffraction, Optical simulations, Modulation

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Proceedings Article | 27 January 2005 Paper

Using the aerial image measurement technique to speed up mask development for 193-nm immersion and polarization lithography

Axel Zibold, Wolfgang Harnisch, Thomas Scheruebl, Norbert Rosenkranz, Joern Greif

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576948

KEYWORDS: Photomasks, Polarization, Scanners, Semiconducting wafers, Reticles, Liquids, Manufacturing, Tolerancing, Neodymium, Lithography

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Proceedings Article | 2 June 2004 Paper

Aerial image measurement technique for today's and future 193-nm lithography mask requirements

Axel Zibold, Thomas Scheruebl, Alexander Menck, Robert Brunner, J. Greif

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568016

KEYWORDS: Photomasks, Lithography, Image resolution, Objectives, 193nm lithography, Lithographic illumination, Beam homogenizers, Polarization, Reticles, Semiconducting wafers

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Proceedings Article | 24 May 2004 Paper

Aerial image measurement technique for fast evaluation of 193-nm lithography masks

Axel Zibold, Thomas Scheruebl, Wolfgang Harnisch, Robert Brunner, J. Greif

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533021

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Scanners, Reticles, Polarization, Phase shifts, Beam homogenizers, Lithographic illumination, Homogenization

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Proceedings Article | 6 June 1997 Paper

Spatiotemporal dynamics in the near field of a 980-nm ridge waveguide pump laser diode

Markus Ziegler, E. Miltenyi, M. Muenkel, J. Greif, G. Jennemann, Ingo Fischer, Harry Asonen, Wolfgang Elsaesser

Proceedings Volume 2994, (1997) https://doi.org/10.1117/12.275608

KEYWORDS: Near field, Semiconductor lasers, Switching, Waveguides, Waveguide lasers, High power lasers, Picosecond phenomena, Laser applications, Optical pumping, Fiber amplifiers

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