Jos W. de Klerk
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Pellicles, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Monochromatic aberrations, Polarization, Manufacturing, Double patterning technology, Immersion lithography, Semiconducting wafers, Overlay metrology, Focus stacking software, Combined lens-mirror systems

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Monochromatic aberrations, Polarization, Water, Control systems, Immersion lithography, Stray light, Semiconducting wafers, Combined lens-mirror systems, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 19, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Curtains, Molecular bridges, Signal attenuation, Scanners, Particles, Control systems, Bridges, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Lithographic illumination, Polarization, Imaging systems, Electroluminescence, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Imaging systems, Control systems, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Binary data, Phase shifts

Showing 5 of 11 publications
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