Dr. Joseph S. Gordon
Senior Member/Technical Staff at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Optical lithography, Contamination, Air contamination, Manufacturing, Pellicles, Humidity, Photomasks, Contamination control

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Reticles, Contamination, Data modeling, Air contamination, Inspection, Humidity, Photomasks, Semiconducting wafers, Atmospheric particles

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Apodization, Optical proximity correction, Pellicles, Data modeling, Lithography, Signal attenuation, Critical dimension metrology, Gaussian filters, Calibration, Optical filters

Proceedings Article | 11 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Reticles, Air contamination, Gases, Sulfur, Nitrogen, Pellicles, Photomasks, Semiconducting wafers, Atmospheric particles

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Apodization, Reticles, Polarization, Spatial frequencies, Pellicles, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 9 publications
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