Dr. Joseph T. Kennedy
Product Manager at Honeywell Electronic Materials
SPIE Involvement:
Publications (10)

Proceedings Article | 18 March 2010 Paper
Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow
Proceedings Volume 7636, 763605 (2010) https://doi.org/10.1117/12.848405
KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200O (2009) https://doi.org/10.1117/12.837205
KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Silicon, Double patterning technology, Optical properties, Lithography, Photoresist developing, Chemistry

Proceedings Article | 1 April 2009 Paper
Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Zhi Liu, Shang-Ho Lin
Proceedings Volume 7273, 72733M (2009) https://doi.org/10.1117/12.814440
KEYWORDS: Photoresist materials, Etching, Optical lithography, Plasma etching, Lithography, Plasma, Silicon, Line width roughness, Scanning electron microscopy, Optical properties

Proceedings Article | 1 April 2009 Paper
Ze-Yu Wu, Joseph Kennedy, Song-Yuan Xie, Ron Katsanes, Kyle Flanigan, Junyan Dai, Nikolaos Bekiaris, Hiram Cervera, Glen Mori, Thomas Wallow
Proceedings Volume 7273, 72731I (2009) https://doi.org/10.1117/12.814416
KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Double patterning technology, Silicon, Optical properties, FT-IR spectroscopy, Lithography, Time division multiplexing

Proceedings Article | 16 March 2009 Paper
Sudip Mukhopadhyay, Joseph Kennedy, Yamini Pandey, Preeti Amin, Jaswinder Gill
Proceedings Volume 7274, 72742J (2009) https://doi.org/10.1117/12.814398
KEYWORDS: Optical lithography, Polymers, Resistance, Optical properties, Bottom antireflective coatings, Photoresist materials, Lithography, FT-IR spectroscopy, Chemistry, Dielectrics

Showing 5 of 10 publications
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