Dr. Joseph T. Kennedy Profile

Dr. Joseph T. Kennedy

Product Manager at Honeywell Electronic Materials

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Author

Publications (10)

Proceedings Article | 18 March 2010 Paper

Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films

Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow

Proceedings Volume 7636, 763605 (2010) https://doi.org/10.1117/12.848405

KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

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Proceedings Article | 11 December 2009 Paper

High Si content anti-reflective coatings and their extension to a UV freeze dual patterning process

Joseph Kennedy, ZeYu Wu, Kyle Flanigan, Junyan Dai, Thomas Wallow

Proceedings Volume 7520, 75200O (2009) https://doi.org/10.1117/12.837205

KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Silicon, Double patterning technology, Optical properties, Lithography, Photoresist developing, Chemistry

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Proceedings Article | 1 April 2009 Paper

High-Si content BARC for dual-BARC systems such as trilayer patterning

Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Zhi Liu, Shang-Ho Lin

Proceedings Volume 7273, 72733M (2009) https://doi.org/10.1117/12.814440

KEYWORDS: Photoresist materials, Etching, Optical lithography, Plasma etching, Lithography, Plasma, Silicon, Line width roughness, Scanning electron microscopy, Optical properties

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Proceedings Article | 1 April 2009 Paper

Performance of an ArF siloxane BARC exposed to a 172-nm UV cure for double patterning applications

Ze-Yu Wu, Joseph Kennedy, Song-Yuan Xie, Ron Katsanes, Kyle Flanigan, Junyan Dai, Nikolaos Bekiaris, Hiram Cervera, Glen Mori, Thomas Wallow

Proceedings Volume 7273, 72731I (2009) https://doi.org/10.1117/12.814416

KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Double patterning technology, Silicon, Optical properties, FT-IR spectroscopy, Lithography, Time division multiplexing

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Proceedings Article | 16 March 2009 Paper

Next generation siloxane-based Bottom Anti-Reflective Coating (BARC) formulations with selective strip rates and required optical properties

Sudip Mukhopadhyay, Joseph Kennedy, Yamini Pandey, Preeti Amin, Jaswinder Gill

Proceedings Volume 7274, 72742J (2009) https://doi.org/10.1117/12.814398

KEYWORDS: Optical lithography, Polymers, Resistance, Optical properties, Bottom antireflective coatings, Photoresist materials, Lithography, FT-IR spectroscopy, Chemistry, Dielectrics

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Proceedings Article | 4 December 2008 Paper

High Si content BARC for applications in dual BARC systems such as tri-layer patterning

Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Nicolette Fender, Junichi Takahashi

Proceedings Volume 7140, 71402S (2008) https://doi.org/10.1117/12.804699

KEYWORDS: Etching, Plasma etching, Photoresist materials, Optical lithography, Plasma, Silicon, Lithography, Optical properties, Polymers, Scanning electron microscopy

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Proceedings Article | 4 April 2008 Paper

A high-Si content middle layer for ArF trilayer patterning

Joseph Kennedy, Songyuan Xie, Ronald Katsanes, Kyle Flanigan, Sudip Mukhopadhyay, Benjamin Wu, Edward Rutter, Mark Slezak

Proceedings Volume 6923, 69230W (2008) https://doi.org/10.1117/12.772854

KEYWORDS: Etching, Optical lithography, Plasma etching, Photoresist materials, Silicon, Plasma, Reflectivity, Chemistry, Photoresist processing, Wet etching

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Proceedings Article | 4 May 2005 Paper

Organosiloxane based bottom antireflective coating for 193nm lithography

Bo Li, Kim Do, Jason Stuck, Songyuan Xie, Roger Leung, Tiffany Nguyen, Jaswinder Gill, Lei Jin, Wenya Fan, Shilpa Thanawala, Faith Zhou, Nancy Iwamoto, Emma Brouk, Joseph Kennedy

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600015

KEYWORDS: Etching, Plasma etching, Photoresist materials, Plasma, Optical lithography, Polymers, Reflectivity, Wet etching, Lithography, Silicon

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Proceedings Article | 12 June 2003 Paper

Organosiloxane-based bottom antireflective coatings for 193-nm lithography

Joseph Kennedy, Teresa Baldwin-Hendricks, Jason Stuck, Arlene Suedmeyer, Shilpa Thanawala, Kim Do, Nancy Iwamoto

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485158

KEYWORDS: Etching, Plasma etching, Plasma, Reflectivity, Optical lithography, Photoresist materials, Lithography, Copper, Silicon carbide, Dielectrics

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Proceedings Article | 12 June 2003 Paper

Anthracene-organosiloxane spin-on antireflective coating for KrF lithography

Joseph Kennedy, Teri Baldwin-Hendricks, Mello Hebert, Arlene Suedmeyer

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485154

KEYWORDS: Etching, Plasma etching, Polymers, Optical lithography, Photoresist materials, Plasma, Chromophores, Silicon, Lithography, Scanning electron microscopy

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Showing 5 of 10 publications

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