Dr. Joseph J. MacFarlane
President/Senior Scientist at Prism Computational Sciences Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Semiconductors, Prisms, Laser energy, Xenon, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Foam, Electrons, Ions, Plasmas, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Spherical lenses, Pulsed laser operation, Tin

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Data modeling, Electrons, Ions, Plasmas, Ionization, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Spherical lenses, Tin

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Atomic, molecular, and optical physics, Optical spheres, Sensors, Laser energy, Computer simulations, Optical simulations, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Prisms, Electrons, Ions, Hydrogen, Plasmas, Diagnostics, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Atomic, molecular, and optical physics, Opacity, Electrons, Ions, Ionization, Optical simulations, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

Showing 5 of 6 publications
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