Joseph T. Parry
Director Litho Applications at Nikon Precision Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Visualization, Scanners, Diagnostics, Photoresist materials, Feedback control, Semiconducting wafers

Proceedings Article | 29 June 1998 Paper
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Reticles, Sensors, Manufacturing, Distortion, Printing, Transmittance, Optical alignment, Semiconducting wafers, Overlay metrology, Temperature metrology

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