Joseph T. Parry
Director Litho Applications at Nikon Precision Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Visualization, Scanners, Diagnostics, Photoresist materials, Feedback control, Semiconducting wafers

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Reticles, Sensors, Manufacturing, Distortion, Printing, Transmittance, Optical alignment, Semiconducting wafers, Overlay metrology, Temperature metrology

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