Joseph T. Parry
Director Litho Applications at Nikon Precision Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Visualization, Semiconducting wafers, Metrology, Lithography, Feedback control, Diagnostics, Reticles, Deep ultraviolet, Photoresist materials, Scanners

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Overlay metrology, Printing, Transmittance, Temperature metrology, Manufacturing, Sensors, Distortion

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