Joseph Perez
SPIE Involvement:
Publications (8)

Proceedings Article | 7 March 2014 Paper
Proc. SPIE. 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
KEYWORDS: Photomasks, Lithography, Antireflective coatings, Nanostructures, Reflectivity, Glasses, Cones, Optical lithography, Ultraviolet radiation, Refraction

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Inspection, Metals, Lithography, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Etching, Image segmentation, Ultraviolet radiation

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Particles, Lithography, Defect inspection, Etching, Optical lithography, Image processing, Manufacturing

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Inspection, Semiconducting wafers, Lithography, Particles, Defect inspection, Ultraviolet radiation, Contamination, Ions, Image processing, Wafer inspection

Showing 5 of 8 publications
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