Dr. Joseph Zekry
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Deep ultraviolet, Scanners, Manufacturing, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization

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