Joshua A. Glasser
at KLA Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Inspection, Reticles, Dysprosium, Defect detection, Optics manufacturing, Algorithm development, Defect inspection, Detection and tracking algorithms, Standards development, Time metrology

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Inspection, Extreme ultraviolet, Optical spheres, Quartz, Particles, Silica, Photomasks, Defect detection, Deep ultraviolet, Defect inspection

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Extreme ultraviolet, Optical spheres, Particles, Quartz, Photomasks, Silica, Deep ultraviolet, Defect detection, Signal to noise ratio

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Inspection, Photomasks, Logic, Defect detection, Optical proximity correction, Detection and tracking algorithms, Sensors, Signal to noise ratio, Modulation, Dysprosium

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