Joshua S. Hooge
Principal Research Scientist at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | 10 July 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Optical lithography, Reticles, Image processing, Coating, Photoresist processing, Photomasks, Photoresist materials, Directed self assembly

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Polymers, Silicon, Directed self assembly, Chemical analysis, Picosecond phenomena, Line edge roughness, Semiconducting wafers

Proceedings Article | 15 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Image processing, Scanners, Scanning electron microscopy, Directed self assembly, Thin film coatings, Semiconducting wafers

SPIE Journal Paper | 1 July 2011
JM3 Vol. 10 Issue 03
KEYWORDS: Data modeling, Extreme ultraviolet, Diffusion, Stochastic processes, Line width roughness, Extreme ultraviolet lithography, Polymers, Absorption, Solids, Critical dimension metrology

Proceedings Article | 25 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Data modeling, Polymers, Diffusion, Solids, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Absorption

Showing 5 of 11 publications
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