Joshua Lessing
Laser Application Engineer
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Etching, Quartz, Ions, Atomic force microscopy, Ion beams, Transmittance, Photomasks, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Etching, Quartz, Ions, Atomic force microscopy, Ion beams, Transmittance, Photomasks, Resolution enhancement technologies, Phase shifts

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Carbon, Opacity, Quartz, Atomic force microscopy, Scanning electron microscopy, Ion beams, Transmittance, Photomasks, Molybdenum, Phase shifts

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Cadmium, Opacity, Etching, Quartz, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Gallium, Binary data

Proceedings Article | 25 August 1999
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Deep ultraviolet, Opacity, Etching, Quartz, Sputter deposition, Atomic force microscopy, Ion beams, Photomasks, Critical dimension metrology, Phase shifts

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top