Mr. Joshua B. Spencer
Graduate Student at Univ of Illinois
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Prisms, Reflectivity, Xenon, Solids, Extreme ultraviolet, Optimization (mathematics), Circuit switching, EUV optics, Plasma

SPIE Journal Paper | July 1, 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Molybdenum, Silicon, Ions, Gold, Xenon, Plasma, Ruthenium, Palladium, Mirrors, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Prisms, Electrons, Ions, Hydrogen, Plasmas, Diagnostics, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Mirrors, Electrodes, Ions, Reflectivity, Photodiodes, Atomic force microscopy, Scanning electron microscopy, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Gold, Crystals, Ions, Silicon, Atomic force microscopy, Xenon, Palladium, Extreme ultraviolet lithography, Molybdenum, Ruthenium

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Laser energy, X-rays, Copper, Ions, X-ray microscopy, Xenon, Black bodies, Extreme ultraviolet, Plasma, Tin

Showing 5 of 6 publications
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