Joshua B. Spencer
Graduate Student at Univ of Illinois
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Solids, Lithography, Xenon, Prisms, Circuit switching, Optimization (mathematics), EUV optics

SPIE Journal Paper | 1 July 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Molybdenum, Silicon, Ions, Gold, Xenon, Plasma, Ruthenium, Palladium, Mirrors, Extreme ultraviolet lithography

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Plasmas, Ions, Xenon, Extreme ultraviolet, Electrons, Hydrogen, Extreme ultraviolet lithography, Prisms, Diagnostics, Lithography

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Photodiodes, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Electrodes, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Ions, Xenon

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Molybdenum, Silicon, Ruthenium, Gold, Ions, Xenon, Palladium, Extreme ultraviolet lithography, Atomic force microscopy, Crystals

Showing 5 of 6 publications
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