Joshua J. Thornes
Program Manager, Technology Development at Cymer LLC
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Light sources, Logic, Optical lithography, Deep ultraviolet, 3D metrology, Photomasks, Immersion lithography

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Light sources, Deep ultraviolet, Excimer lasers, Excimers, Neon, Chemical elements, Molybdenum, Fluorine, Halogens

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Light sources, Optical lithography, Deep ultraviolet, Manufacturing, Control systems, Helium, Critical dimension metrology, Molybdenum

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Light sources, Optical lithography, Scanners, Manufacturing, Control systems, Cadmium sulfide, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Light sources, Optical amplifiers, Optical lithography, Switching, Scanners, Semiconducting wafers, Light, Near field optics

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Light sources, Scanners, Control systems, Cadmium sulfide, Algorithm development, Semiconducting wafers, Yield improvement, Systems modeling, Overlay metrology

Showing 5 of 10 publications
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