Joydeep Mitra
Senior Software Architect at
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 23 March 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

Proceedings Article | 30 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Calibration, Printing, Monte Carlo methods, Photomasks, Directed self assembly, Connectors, Optimization (mathematics), Model-based design, Resolution enhancement technologies

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Polymers, Manufacturing, Inspection, Design for manufacturing, Photomasks, Directed self assembly, Epitaxy, Electronic design automation, Systems modeling

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Composites, Manufacturing, Printing, Monte Carlo methods, Photomasks, Directed self assembly, Chemical analysis, Double patterning technology, Optics manufacturing, Global Positioning System, Resolution enhancement technologies

SPIE Journal Paper | 29 September 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Showing 5 of 8 publications
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