Ju-Mi Bang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Etching, Image processing, Chromium, Transmittance, Photomasks, Immersion lithography, Nanoimprint lithography, Semiconducting wafers, Phase shifts

Proceedings Article | 14 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Manufacturing, Inspection, Control systems, Printing, Photomasks, SRAF, Mask making, Critical dimension metrology

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data storage, Databases, Silver, Manufacturing, Computing systems, Distributed computing, Photomasks, Optical proximity correction, Data conversion, Resolution enhancement technologies

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