Dr. Juan Andres Torres
Advanced RET Flow Architect at Mentor, a Siemens Business
SPIE Involvement:
Senior status | Author | Instructor
Publications (60)

SPIE Journal Paper | March 23, 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Composites, Manufacturing, Printing, Monte Carlo methods, Photomasks, Directed self assembly, Chemical analysis, Double patterning technology, Optics manufacturing, Global Positioning System, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Calibration, Printing, Monte Carlo methods, Photomasks, Directed self assembly, Connectors, Optimization (mathematics), Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Polymers, Manufacturing, Inspection, Design for manufacturing, Photomasks, Directed self assembly, Epitaxy, Electronic design automation, Systems modeling

SPIE Journal Paper | September 29, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Showing 5 of 60 publications
Conference Committee Involvement (2)
ICCAD
3 November 2014 |
Design Automation Conference
1 June 2014 |
Course Instructor
SC1101: Understanding Design-Patterning Interactions
This course explains how layout and circuit design interact with lithography choices. We especially focus on multi-patterning technologies such as LELE double patterning and SADP. We will explore role of design in lithography technology development as well as in lithographic process control. We will further discuss design enablement of multi-patterning technologies, especially in context of cell-based digital designs.
SC1187: Understanding Design-Patterning Interactions for EUV and DSA
EUV lithography and DSA haven been accepted by the industry as most promising candidates for dimensional scaling enablement at N7 technology node and beyond. This tutorial explains how introduction of such lithography technologies going to impact layout and circuit design. Choices of lithography would impact physical design and have a significant impact at system level. This tutorial will focus on transition from 193i multi-patterning technologies to EUV lithography and DSA. Factors that would determine on the enablement of these technologies would be highlighted and possible solutions would be shared.
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