Dr. Juan P. Bravo-Vasquez
at Pureleau
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beam lithography, Polymers, Glasses, Molecules, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemical elements

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beam lithography, Polymers, Silicon, Nitrogen, Humidity, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Chlorine

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Polymers, Silicon, Nitrogen, Polymerization, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Chlorine

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Polymers, Metals, Silicon, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

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