Judith A. Huckabay
Architect and Sales Representative at Cadence Design Systems Inc
SPIE Involvement:
Publications (8)

Proceedings Article | 13 March 2009 Paper
Huixiong Dai, Jason Sweis, Chris Bencher, Yongmei Chen, Jen Shu, Xumou Xu, Chris Ngai, Judy Huckabay, Milind Weling
Proceedings Volume 7275, 72751E (2009) https://doi.org/10.1117/12.814423
KEYWORDS: Photomasks, Double patterning technology, Etching, Scanners, Lithography, Manufacturing, Logic, Optical lithography, Electronic design automation, Optical proximity correction

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67301L (2007) https://doi.org/10.1117/12.746689
KEYWORDS: Double patterning technology, Design for manufacturing, Algorithm development, Deep ultraviolet, Rule based systems, Optical lithography, Model-based design, Performance modeling, Logic, Photomasks

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67300W (2007) https://doi.org/10.1117/12.747409
KEYWORDS: Photomasks, Resistance, Metals, Error analysis, Capacitance, Double patterning technology, Device simulation, Overlay metrology, Lithography, Resolution enhancement technologies

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301J (2007) https://doi.org/10.1117/12.746982
KEYWORDS: Photomasks, Optical proximity correction, Inspection, Design for manufacturing, Lithography, Double patterning technology, Electronic design automation, Vestigial sideband modulation, Beam shaping, Printing

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634910 (2006) https://doi.org/10.1117/12.687747
KEYWORDS: Double patterning technology, Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Neodymium, Logic, Optical lithography, Scanners, Resolution enhancement technologies

Showing 5 of 8 publications
Conference Committee Involvement (1)
Photomask Technology
7 October 2008 | Monterey, California, United States
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