Dr. Jue-Chin Yu
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Mathematical modeling, Optical lithography, Spatial frequencies, Image acquisition, Linear filtering, Photomasks, Source mask optimization, Optimization (mathematics), Electro optical modeling, Resolution enhancement technologies

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, SRAF, Optical proximity correction, Wavefronts, Nanoimprint lithography, Lithography, Chaos, Image segmentation, Diffraction, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Superposition, Lithography, Optical lithography, Manufacturing, Wavefronts, Photoresist materials, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Spatial frequencies, Image acquisition, Photoresist materials, Photomasks, Source mask optimization, Optical proximity correction, Molybdenum, Resolution enhancement technologies

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photomasks, Integrated optics, Integrated circuits, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Optics manufacturing

Showing 5 of 8 publications
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