Juhwan Kim
Dir. of Advanced Technology Deployment at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Computer simulations, Bridges, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Photovoltaics, Logic, Manufacturing, Photomasks, Image enhancement, Double patterning technology, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Data modeling, Error analysis, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Showing 5 of 13 publications
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