Dr. Juhyun Kim
at Dongbu Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Etching, Image processing, Resistance, Image resolution, Image analysis, Photomasks, Critical dimension metrology, Failure analysis, Edge roughness

Proceedings Article | 30 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Refractive index, Etching, Dielectrics, Interfaces, Silicon, Reflectivity, Photomasks, Plasma enhanced chemical vapor deposition, Plasma etching, Silicon carbide

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Reticles, Optical lithography, Cadmium, Electroluminescence, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Data modeling, Etching, Image processing, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling, Instrument modeling

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top