Dr. Julia Simon
at Commissariat à l'Energie Atomique
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Cadmium, Image processing, Coating, Photoresist materials, Double patterning technology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mirrors, Contamination, Calibration, Molecules, Mass spectrometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Analytical research, EUV optics

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beam lithography, Polymers, Capillaries, Interfaces, Extreme ultraviolet, Extreme ultraviolet lithography, Adhesives, Liquids, Chemically amplified resists

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Etching, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Dielectrics, Silicon, Chemistry, Reflectivity, Photomasks, Silicon carbide, Semiconducting wafers, 193nm lithography, Plasma

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