Juliann Opitz
Senior Process Engineer at Mentor Graphics Corp
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Author
Publications (22)

PROCEEDINGS ARTICLE | March 15, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Optical lithography, Visualization, Interfaces, Manufacturing, Design for manufacturing, Photomasks, Double patterning technology, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Semiconductors, Lithography, Diffraction, Reticles, Metrology, Optical lithography, Chromium, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Thin films, Diffraction, Polishing, Manufacturing, Data transmission, Optical alignment, Scanning probe microscopy, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Surface roughness, Photoresist materials, Photomasks, Reactive ion etching, 193nm lithography, Phase shifts

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Carbon, Lithography, Quartz, Polymers, Crystals, Silicon, Carbonates, Polymerization, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Oxides, Lithography, Transparency, Deep ultraviolet, Etching, Polymers, Resistance, Photoresist materials, Polymerization, Absorbance

Showing 5 of 22 publications
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