Julien Mailfert
Product Marketing
SPIE Involvement:
Publications (12)

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9778, 97780W (2016) https://doi.org/10.1117/12.2221894
KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Logic, Image processing, Process control, Electron microscopes, Tolerancing, Distance measurement, Lithography, Finite element methods, Calibration

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 966105 (2015) https://doi.org/10.1117/12.2196862
KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942609 (2015) https://doi.org/10.1117/12.2085823
KEYWORDS: Optical lithography, Logic, Semiconducting wafers, Line width roughness, Light sources, Photomasks, Optical proximity correction, Lithography, Process control, Critical dimension metrology

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904809 (2014) https://doi.org/10.1117/12.2047827
KEYWORDS: Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet, Photomasks, Optical proximity correction, Nanoimprint lithography, Contamination, Principal component analysis, Critical dimension metrology

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90500V (2014) https://doi.org/10.1117/12.2046783
KEYWORDS: Personal protective equipment, Optical proximity correction, Optical lithography, Metrology, Etching, Semiconducting wafers, Metals, Lithography, Photomasks, Reliability

Showing 5 of 12 publications
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