Julien Mailfert
Product Marketing
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 25 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Logic, Calibration, Image processing, Electron microscopes, Scanning electron microscopy, Distance measurement, Process control, Finite element methods, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Logic, Optical lithography, Modulation, Metals, Scanners, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Process control, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Principal component analysis, Contamination, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Metals, Reliability, Photomasks, Optical proximity correction, Semiconducting wafers, Personal protective equipment

Showing 5 of 12 publications
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