Juliet A. Rubinstein
at Univ of California Berkeley
SPIE Involvement:
Publications (12)

Proceedings Article | 19 May 2011 Paper
Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan
Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394
KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72741A (2009) https://doi.org/10.1117/12.814190
KEYWORDS: Double patterning technology, Optical proximity correction, Monochromatic aberrations, Data modeling, Convolution, Point spread functions, Logic, Optical simulations, Fourier transforms, Zernike polynomials

Proceedings Article | 13 March 2009 Paper
Wojtek Poppe, Patrick Au, Darshana Jayasuriya, Juliet Rubinstein, Andrew Neureuther
Proceedings Volume 7275, 727507 (2009) https://doi.org/10.1117/12.814448
KEYWORDS: Etching, Semiconducting wafers, Resistance, Design for manufacturing, Lithography, Process control, Photomasks, Structural design, Metrology, Calibration

Proceedings Article | 12 March 2008 Paper
Proceedings Volume 6924, 69240O (2008) https://doi.org/10.1117/12.772891
KEYWORDS: Monochromatic aberrations, Optical proximity correction, Double patterning technology, Lithography, Photomasks, Fourier transforms, Phase shifts, Data modeling, Etching, Image quality standards

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 673039 (2007) https://doi.org/10.1117/12.746728
KEYWORDS: Photomasks, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Metals, Double patterning technology, Phase shifts, Printing, Neck, Image processing

Showing 5 of 12 publications
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