Juliet A. Rubinstein
at Univ of California Berkeley
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Reticles, Image processing, Inspection, Design for manufacturing, Photomasks, Double patterning technology, Line edge roughness, Algorithm development, Device simulation

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Monochromatic aberrations, Point spread functions, Logic, Data modeling, Fourier transforms, Zernike polynomials, Optical simulations, Double patterning technology, Optical proximity correction, Convolution

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Metrology, Calibration, Etching, Resistance, Process control, Design for manufacturing, Photomasks, Structural design, Semiconducting wafers

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Monochromatic aberrations, Data modeling, Etching, Fourier transforms, Photomasks, Double patterning technology, Optical proximity correction, Image quality standards, Phase shifts

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Neck, Metals, Image processing, Scanning electron microscopy, Printing, Photoresist materials, Photomasks, Double patterning technology, Semiconducting wafers, Phase shifts

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top