Julio R. Reyes
Senior Engineer at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Particles, Chemistry, Reflectivity, Photoresist materials, Transmittance, Photomasks, Photoresist processing, Binary data, Mask cleaning

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Air contamination, Glasses, Chemistry, Inspection, Pellicles, Photomasks, Environmental sensing, Binary data

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reflectors, Lithography, Optical lithography, Etching, Image processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Contamination, Etching, Reflectivity, Photomasks, Scanning probe microscopy, Phase measurement, Chlorine, Fluorine, Photoresist processing, Phase shifts

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