Dr. Julius Joseph S. Santillan
Researcher at Osaka Univ
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 28 June 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Oxides, Nanoparticles, Metals, X-rays, Reflectivity, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Zirconium dioxide

Proceedings Article | 12 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metals, Atomic force microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Analytical research, Photoresist processing

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Metals, Infrared lasers, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Scientific research, Photoresist processing, Free electron lasers, Photoresist developing

Showing 5 of 33 publications
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