Dr. Julius Joseph S. Santillan
Researcher at Osaka Univ
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Extreme ultraviolet lithography, Scanning electron microscopy, Photoresist processing, Extreme ultraviolet, Optical lithography, Medium wave, Line width roughness, Line edge roughness, Semiconductors, Lithography

Proceedings Article | 14 October 2020 Poster + Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Stochastic processes, Photoresist processing, Extreme ultraviolet lithography, Optical lithography, Standards development, Bridges, Line width roughness, Lithography

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Optical lithography, Semiconductors, Lithography

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Optical lithography, Excimer lasers, Laser applications, Laser systems engineering, Laser ablation, Semiconductors, Packaging

Proceedings Article | 28 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Nanoparticles, Line width roughness, Metals, Oxides, X-rays, Reflectivity, Extreme ultraviolet, Zirconium dioxide, Extreme ultraviolet lithography

Showing 5 of 37 publications
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