Jun-Kyu Ahn
at MagnaChip Semiconductor, Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Finite-difference time-domain method, Metals, Error analysis, Tungsten, Dielectrics, Coating, Interference (communication), Optical alignment, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Data modeling, Control systems, Printing, Optical proximity correction, Yield improvement, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Dielectrics, Chemistry, Oxygen, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Optical lithography, Interferometers, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

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