Mr. Jun-Kyu Ahn Profile

Jun-Kyu Ahn

at MagnaChip Semiconductor, Ltd

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Author

Publications (4)

Proceedings Article | 24 March 2009 Paper

Optimization of alignment strategy for metal layer on local interconnect integration

Jun-Kyu Ahn, Ji-Hyun Ha, Hong-Ik Kim, Jeong-Lyeol Park, Jae-Sung Choi, Tae-Jong Lee

Proceedings Volume 7272, 727233 (2009) https://doi.org/10.1117/12.814434

KEYWORDS: Optical alignment, Metals, Coating, Interference (communication), Semiconducting wafers, Tungsten, Photoresist processing, Dielectrics, Error analysis, Finite-difference time-domain method

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Proceedings Article | 20 March 2006 Paper

Effect of lens aberrations on OPC model accuracy for low k1 lithography process

Jun-Kyu Ahn, Chang-Young Jeong, Jeong-Lyeol Park, Jae-Sung Choi, Jeong-Gun Lee

Proceedings Volume 6154, 615432 (2006) https://doi.org/10.1117/12.656136

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Lithography, Printing, Data modeling, Yield improvement, Phase shifts, Monochromatic aberrations, Semiconductors, Control systems

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Proceedings Article | 12 May 2005 Paper

The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Chang-Young Jeong, Jun-Kyu Ahn, Ki-Yeop Park, Jae Choi, Jeong Lee

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600418

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Optical lithography, Monochromatic aberrations, Optical proximity correction, Phase shifts, Interferometers, Semiconductors

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Proceedings Article | 14 May 2004 Paper

Integration using inorganic BARC in a via first dual-damascene process with low-k dielectric

Jun Kyu Ahn, Seon Ho Choi, Young Keun Kim, Ki Yeop Park, Jae Sung Choi, Eun Suk Hong, Kang Sup Shin, Si Bum Kim, Kyeong Keun Choi, Sung Bo Hwang, Jeong Gun Lee

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536282

KEYWORDS: Etching, Optical lithography, Dielectrics, Lithography, Critical dimension metrology, Photoresist materials, Photoresist processing, Chemistry, Scanning electron microscopy, Oxygen

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