Mr. Jun Sik Lee
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Packaging, Reticles, Air contamination, Ultraviolet radiation, Inspection, Raman spectroscopy, Organic materials, Pellicles, Photomasks, Explosives

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Carbon, Lithography, Contamination, Reflectivity, Raman spectroscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Analytical research

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Air contamination, Molecules, Ions, Manufacturing, Pellicles, Photomasks, Semiconducting wafers, Environmental sensing

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Dry etching, Air contamination, Glasses, Ions, Heat treatments, Atomic force microscopy, Photomasks, Wet etching, Molybdenum

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Contamination, Air contamination, Ultraviolet radiation, Ions, Atomic force microscopy, Oxygen, Transmission electron microscopy, Photomasks, Chemical analysis, Phase shifts

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Ions, Inspection, Scanning electron microscopy, Raman spectroscopy, Pellicles, Photomasks, Chemical analysis, Adhesives, Chromatography

Showing 5 of 7 publications
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