Jun Sik Lee
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Packaging, Reticles, Air contamination, Ultraviolet radiation, Inspection, Raman spectroscopy, Organic materials, Pellicles, Photomasks, Explosives

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Carbon, Lithography, Contamination, Reflectivity, Raman spectroscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Analytical research

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Air contamination, Molecules, Ions, Manufacturing, Pellicles, Photomasks, Semiconducting wafers, Environmental sensing

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Dry etching, Air contamination, Glasses, Ions, Heat treatments, Atomic force microscopy, Photomasks, Wet etching, Molybdenum

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Contamination, Air contamination, Ultraviolet radiation, Ions, Atomic force microscopy, Oxygen, Transmission electron microscopy, Photomasks, Chemical analysis, Phase shifts

Showing 5 of 7 publications
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