Jun-Taek Park
Technical Staff at SK Hynix Inc
SPIE Involvement:
Publications (20)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480A (2014) https://doi.org/10.1117/12.2048282
KEYWORDS: Etching, Liquid phase epitaxy, Stochastic processes, Photomasks, Metrology, Critical dimension metrology, Printing, Scanning electron microscopy, Extreme ultraviolet, Error analysis

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83221O (2012) https://doi.org/10.1117/12.916108
KEYWORDS: Critical dimension metrology, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Optical proximity correction, Scanners, Deep ultraviolet, EUV optics, Semiconductors, Reticles

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 832230 (2012) https://doi.org/10.1117/12.918019
KEYWORDS: Pellicles, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Thin films, Silicon, Computer simulations, Lithography, Distortion, Data modeling

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691N (2011) https://doi.org/10.1117/12.879450
KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Optical lithography, Extreme ultraviolet, Photomasks, Lithography, Lithographic illumination, Line width roughness, High volume manufacturing, Scanners

Proceedings Article | 6 April 2011 Paper
Proceedings Volume 7969, 79690Y (2011) https://doi.org/10.1117/12.879371
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Reflectivity, Extreme ultraviolet, Semiconducting wafers, Nanoimprint lithography, Printing, Optical lithography, Scanning electron microscopy

Showing 5 of 20 publications
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