Jun-Taek Park
Technical Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Metrology, Liquid phase epitaxy, Etching, Error analysis, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Stochastic processes

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Reticles, Deep ultraviolet, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, EUV optics

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Thin films, Lithography, Data modeling, Silicon, Distortion, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 6 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Optical lithography, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 20 publications
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