Jun-ichi Kon
Researcher of Resist Materials at Fujitsu Labs Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Electron beam lithography, Optical lithography, Silica, Metals, Control systems, Process control, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Signal detection

SPIE Journal Paper | 7 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Metals, Control systems, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Diffusion, Manufacturing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Photoresist processing, Beam analyzers, Chemically amplified resists

Proceedings Article | 20 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Calibration, Etching, Copper, Manufacturing, Photomasks, Critical dimension metrology, Electron beam direct write lithography, Semiconducting wafers, Prototyping, Vestigial sideband modulation

Showing 5 of 7 publications
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