So far, the history of silicon gratings has more than 20 years and the development of fabrication methods and applications have improved a lot. Microfabrication process to made silicon gratings can be divided into bulk silicon and surface silicon technology. All these technologies are compatible with the process of MEMS, and this made it possible to fabricate micro spectrometers. We present the fabrication process of a grating by using (111) silicon wafer. The silicon gratings were manufactured using silicon micromachining techniques, as ultraviolet lithography and anisotropic wet etching, achieving good uniformity surface and grating facets of excellent optical quality. Some testing results on the silicon grating are presented.
In this paper, we introduce a new embossing holographic technique: holographic dual-beams interference technique. Using this technique, we can make more dynamic and brighter 2D holograms, which are used widely recently. Some methods of preparing images by computer are discussed in the paper.