Dr. Jun Gou Profile

Dr. Jun Gou

at Univ of Electronic Science and Technology of China

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 5 November 2020 Paper

Colloidal quantum dot-silicon photodetector based on TCAD simulation

Yuanlin Shi, Zhiming Wu, Jun Gou, Xiang Dong, Jun Wang, Yadong Jiang

Proceedings Volume 11567, 115670Z (2020) https://doi.org/10.1117/12.2576295

KEYWORDS: Doping, Silicon, Photodetectors, Sensors, External quantum efficiency, Quantum dots, Resistance, TCAD, Optoelectronic devices

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Proceedings Article | 25 October 2016 Paper

THz transmittance and electrical properties of silicon doped vanadium dioxide films tuning by annealing temperature

Xuefei Wu, Zhiming Wu, Chunhui Ji, Zehua Huang, Jun Gou, Jun Wang, Yadong Jiang

Proceedings Volume 9686, 968603 (2016) https://doi.org/10.1117/12.2242776

KEYWORDS: Vanadium, Annealing, Terahertz radiation, Transmittance, Silicon, Silicon films, Crystals, Phase shift keying, Modulation, Resistance

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Proceedings Article | 25 October 2016 Paper

Detection of terahertz radiation using improved uncooled focal plane array detector

Xing Zheng, Zhiming Wu, Jun Gou, ZhiQing Liang, Yadong Jiang

Proceedings Volume 9686, 96861J (2016) https://doi.org/10.1117/12.2242405

KEYWORDS: Terahertz radiation, Absorption, Sensors, Staring arrays, Microbolometers, Imaging systems, Reactive ion etching, Sputter deposition, Thin films, Millimeter wave sensors

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Proceedings Article | 21 December 2013 Paper

Reactive ion etching and OES endpoint detection of AlCu thin film

Jun Gou, Hui Ling Tai, Jun Wang, Xiong Bang Wei, Ya Dong Jiang

Proceedings Volume 9047, 90470K (2013) https://doi.org/10.1117/12.2042642

KEYWORDS: Etching, Reactive ion etching, Aluminum, Plasma, Gases, Thin films, Chlorine, Semiconducting wafers, Optical lithography, Copper

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Proceedings Article | 20 November 2009 Paper

Influence of PECVD process parameters on the etching Rate of SiN[sub]x[/sub] films

Jun Gou, Zhi-ming Wu, Hui-ling Tai, Kai Yuan

Proceedings Volume 7510, 75100G (2009) https://doi.org/10.1117/12.837860

KEYWORDS: Etching, Plasma enhanced chemical vapor deposition, Reactive ion etching, Thin films, Silicon films, Silicon, Refractive index, Thin film deposition, Corrosion, Dielectrics

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Showing 5 of 6 publications

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