Feed-forward alignment correction for advanced overlay process control using a standalone alignment station "Litho Booster"
Practical performance and enabling technologies in immersion scanners for the double patterning generation
Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation
Double-patterning requirements for optical lithography and prospects for optical extension without double patterning
Double patterning requirements for optical lithography and prospects for optical extension without double patterning
Adapting immersion exposure to mass production by adopting a cluster of novel resist-coating/developing and immersion-exposure equipment