Dr. Jun Iwashita
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Environmental monitoring, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Lithographic illumination, Deep ultraviolet, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Stars, Polymers, Diffusion, Image quality, Polymerization, Extreme ultraviolet lithography, Semiconducting wafers, Floods, Polymer thin films

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Stars, Lithographic illumination, Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Nonlinear control

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Contamination, Scanners, Photomasks, Double patterning technology, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

Showing 5 of 7 publications
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