Dr. Jun Kim
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Defect detection, Detection and tracking algorithms, Data modeling, Scanners, Inspection, Transform theory, Photomasks, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Reticles, Contamination, Calibration, Etching, Inspection, Image transmission, Photomasks, Optical proximity correction, Phase shifts, Defect inspection

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