Dr. Jun Kim
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect inspection, Wafer inspection, Defect detection, Lithography, Critical dimension metrology, Contamination

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Inspection, Photomasks, Reticles, Phase shifts, Contamination, Image transmission, Defect inspection, Etching, Optical proximity correction, Calibration

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