Dr. Jun Wang
at Univ of Hong Kong
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | January 1, 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Photomasks, Transistors, Lithography, Standards development, Resolution enhancement technologies, Field effect transistors, Capacitance, Phase shifts, Image quality standards, Binary data

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Manufacturing, Doping, Photomasks, Transistors, Field effect transistors, Resistors, Standards development, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Capacitance, Photomasks, Transistors, Field effect transistors, Binary data, Standards development, Resolution enhancement technologies, Image quality standards, Phase shifts

PROCEEDINGS ARTICLE | July 2, 2003
Proc. SPIE. 5043, Cost and Performance in Integrated Circuit Creation
KEYWORDS: Lithography, Lithographic illumination, Power supplies, Capacitance, Photomasks, Transistors, Field effect transistors, Standards development, Resolution enhancement technologies, Image quality standards

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