Dr. Jun Yashima
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Electron beam lithography, Roentgenium, Modulation, Quartz, Diffusion, Computer simulations, Photomasks, Critical dimension metrology, Thermal modeling, Temperature metrology

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Seaborgium, Amplifiers, LCDs, Photomasks, Beam shaping, Electron beam melting, Mask making, Data conversion, New and emerging technologies

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beams, Logic, Amplifiers, LCDs, Objectives, Photomasks, Electron beam melting, Mask making, Vestigial sideband modulation, New and emerging technologies

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Data modeling, Modulation, Scattering, Data processing, Software development, Photomasks, Electron beam melting, Critical dimension metrology, Forward error correction, Data corrections

SPIE Journal Paper | October 1, 2008
JM3 Vol. 7 Issue 04
KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

Showing 5 of 10 publications
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