Dr. Jun Yashima
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Critical dimension metrology, Modulation, Temperature metrology, Computer simulations, Photomasks, Quartz, Thermal modeling, Diffusion, Roentgenium, Electron beam lithography

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Photomasks, Electron beam melting, Electron beams, Data conversion, Amplifiers, LCDs, Mask making, Seaborgium, Beam shaping

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Photomasks, Electron beam melting, Amplifiers, Electron beams, Logic, LCDs, Mask making, Objectives, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Forward error correction, Critical dimension metrology, Modulation, Photomasks, Data processing, Data corrections, Software development, Scattering, Data modeling, Electron beam melting

SPIE Journal Paper | October 1, 2008
JM3 Vol. 7 Issue 04
KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top