Dr. Jun Ye
President and Sales Representative at ASML
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 26 February 2021 Presentation
Proc. SPIE. 11613, Optical Microlithography XXXIV

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Image processing, Neural networks, Extreme ultraviolet, Machine learning, Optical proximity correction, Photoresist processing, Statistical modeling, Performance modeling

Proceedings Article | 30 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Databases, Manufacturing, Data processing, Design for manufacturing, Extreme ultraviolet, Optical proximity correction, Optical calibration, Model-based design, Process modeling, Standards development

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Defect detection, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Model-based design

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Electroluminescence, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Molybdenum, Astatine, Resolution enhancement technologies

Showing 5 of 16 publications
Conference Committee Involvement (1)
Advanced Microlithography Technologies
8 November 2004 | Beijing, China
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